Thermally robust Ni germanide technology using cosputtering of Ni and Pt for high-performance nanoscale Ge MOSFETs

Min Ho Kang, Hong Sik Shin, Jung Ho Yoo, Ga Won Lee, Jung Woo Oh, Prashant Majhi, Raj Jammy, Hi Deok Lee

Research output: Contribution to journalArticle

9 Citations (Scopus)

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Engineering & Materials Science