Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates

Geuntak Lee, Pil Sung Jo, Bokyung Yoon, Tae Hee Kim, Himadri Acharya, Hiroshi Ito, Ho Cheol Kim, June Huh, Cheolmin Park

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Abstract

We have investigated the formation of as-cast thin films of a poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer spin-coated directly on topographic prepattern substrates. Either wetting or dewetting of a polymer thin film, on the elevated regions occurs in the nonequilibrium state during spin-coating with solvent vapor saturated and strongly depends on the dimensions of the prepatterns. The ratio of periodic unit area to elevated one of a prepattern (β value) is found as one of the most important factors for wettability of a thin film. The dewetting of a thin film, guided by the edges of either elevated individual periodic lines or mesas, took place with self-assembled block copolymer nanostructure when the β value was greater than a critical value of ̃4 in our system.

Original languageEnglish
Pages (from-to)9290-9294
Number of pages5
JournalMacromolecules
Volume41
Issue number23
DOIs
Publication statusPublished - 2008 Dec 9

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All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

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