Abstract
We have investigated the formation of as-cast thin films of a poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer spin-coated directly on topographic prepattern substrates. Either wetting or dewetting of a polymer thin film, on the elevated regions occurs in the nonequilibrium state during spin-coating with solvent vapor saturated and strongly depends on the dimensions of the prepatterns. The ratio of periodic unit area to elevated one of a prepattern (β value) is found as one of the most important factors for wettability of a thin film. The dewetting of a thin film, guided by the edges of either elevated individual periodic lines or mesas, took place with self-assembled block copolymer nanostructure when the β value was greater than a critical value of ̃4 in our system.
| Original language | English |
|---|---|
| Pages (from-to) | 9290-9294 |
| Number of pages | 5 |
| Journal | Macromolecules |
| Volume | 41 |
| Issue number | 23 |
| DOIs | |
| Publication status | Published - 2008 Dec 9 |
Fingerprint
All Science Journal Classification (ASJC) codes
- Organic Chemistry
- Polymers and Plastics
- Inorganic Chemistry
- Materials Chemistry
Cite this
}
Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates. / Lee, Geuntak; Jo, Pil Sung; Yoon, Bokyung; Kim, Tae Hee; Acharya, Himadri; Ito, Hiroshi; Kim, Ho Cheol; Huh, June; Park, Cheolmin.
In: Macromolecules, Vol. 41, No. 23, 09.12.2008, p. 9290-9294.Research output: Contribution to journal › Article
TY - JOUR
T1 - Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates
AU - Lee, Geuntak
AU - Jo, Pil Sung
AU - Yoon, Bokyung
AU - Kim, Tae Hee
AU - Acharya, Himadri
AU - Ito, Hiroshi
AU - Kim, Ho Cheol
AU - Huh, June
AU - Park, Cheolmin
PY - 2008/12/9
Y1 - 2008/12/9
N2 - We have investigated the formation of as-cast thin films of a poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer spin-coated directly on topographic prepattern substrates. Either wetting or dewetting of a polymer thin film, on the elevated regions occurs in the nonequilibrium state during spin-coating with solvent vapor saturated and strongly depends on the dimensions of the prepatterns. The ratio of periodic unit area to elevated one of a prepattern (β value) is found as one of the most important factors for wettability of a thin film. The dewetting of a thin film, guided by the edges of either elevated individual periodic lines or mesas, took place with self-assembled block copolymer nanostructure when the β value was greater than a critical value of ̃4 in our system.
AB - We have investigated the formation of as-cast thin films of a poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer spin-coated directly on topographic prepattern substrates. Either wetting or dewetting of a polymer thin film, on the elevated regions occurs in the nonequilibrium state during spin-coating with solvent vapor saturated and strongly depends on the dimensions of the prepatterns. The ratio of periodic unit area to elevated one of a prepattern (β value) is found as one of the most important factors for wettability of a thin film. The dewetting of a thin film, guided by the edges of either elevated individual periodic lines or mesas, took place with self-assembled block copolymer nanostructure when the β value was greater than a critical value of ̃4 in our system.
UR - http://www.scopus.com/inward/record.url?scp=64549105184&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=64549105184&partnerID=8YFLogxK
U2 - 10.1021/ma801631y
DO - 10.1021/ma801631y
M3 - Article
AN - SCOPUS:64549105184
VL - 41
SP - 9290
EP - 9294
JO - Macromolecules
JF - Macromolecules
SN - 0024-9297
IS - 23
ER -