Three-dimensional nanofabrication with rubber stamps and conformable photomasks

Seokwoo Jeon, Etienne Menard, Jang Ung Park, Joana Maria, Matthew Meitl, Jana Zaumseil, John A. Rogers

Research output: Contribution to journalReview article

105 Citations (Scopus)

Abstract

This article briefly describes two recently developed soft-lithographic techniques that can be used to fabricate complex, well-defined three-dimensional (3D) nanostructures. The first relies on the single or multilayer transfer of thin solid 'ink' coatings from high-resolution rubber stamps. The second uses these stamps as conformable phase masks for proximity field nanopatterning of thin layers of transparent photopolymers. Although both techniques use the same pattern-transfer elements, they rely on completely different physical principles and they provide complementary patterning capabilities. The operational simplicity of the techniques, their ability to pattern large areas quickly, and the flexibility in the geometry of structures that can be formed with them suggest general utility for 3D nanomanufacturing.

Original languageEnglish
Pages (from-to)1369-1373
Number of pages5
JournalAdvanced Materials
Volume16
Issue number15 SPEC. ISS.
DOIs
Publication statusPublished - 2004 Aug 3

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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    Jeon, S., Menard, E., Park, J. U., Maria, J., Meitl, M., Zaumseil, J., & Rogers, J. A. (2004). Three-dimensional nanofabrication with rubber stamps and conformable photomasks. Advanced Materials, 16(15 SPEC. ISS.), 1369-1373. https://doi.org/10.1002/adma.200400593