Titanium oxide films on Si(100) deposited by e-beam evaporation

H. K. Jang; S. W. Whangbo; Y. K. Choi; Y. D. Chung; K. Jeong; C. N. Whang; Y. S. Lee; H. S. Lee; J. Y. Choi; G. H. Kim; T. K. Kim

doi:10.1116/1.1312377

Titanium oxide films on Si(100) deposited by e-beam evaporation

H. K. Jang, S. W. Whangbo, Y. K. Choi, Y. D. Chung, K. Jeong, C. N. Whang, Y. S. Lee, H. S. Lee, J. Y. Choi, G. H. Kim, T. K. Kim

Department of Physics

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

E-beam evaporation was used to deposit the titanium oxide films with a thickness of 400 nm on silicon (Si) (100) at room temperature. The effect of oxygen on the surface roughness, composition and chemical states was studied by evaporating the titanium dioxide in the oxygen environment. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and X-ray absorption near-edge spectroscopy (XANES) were used for the analysis.

Original language	English
Pages (from-to)	2932-2936
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	18
Issue number	6
DOIs	https://doi.org/10.1116/1.1312377
Publication status	Published - 2000 Nov

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1116/1.1312377

Cite this

@article{7e56c2a402db4c45a3e486211aa62905,

title = "Titanium oxide films on Si(100) deposited by e-beam evaporation",

abstract = "E-beam evaporation was used to deposit the titanium oxide films with a thickness of 400 nm on silicon (Si) (100) at room temperature. The effect of oxygen on the surface roughness, composition and chemical states was studied by evaporating the titanium dioxide in the oxygen environment. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and X-ray absorption near-edge spectroscopy (XANES) were used for the analysis.",

author = "Jang, {H. K.} and Whangbo, {S. W.} and Choi, {Y. K.} and Chung, {Y. D.} and K. Jeong and Whang, {C. N.} and Lee, {Y. S.} and Lee, {H. S.} and Choi, {J. Y.} and Kim, {G. H.} and Kim, {T. K.}",

year = "2000",

month = nov,

doi = "10.1116/1.1312377",

language = "English",

volume = "18",

pages = "2932--2936",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Titanium oxide films on Si(100) deposited by e-beam evaporation

AU - Jang, H. K.

AU - Whangbo, S. W.

AU - Choi, Y. K.

AU - Chung, Y. D.

AU - Jeong, K.

AU - Whang, C. N.

AU - Lee, Y. S.

AU - Lee, H. S.

AU - Choi, J. Y.

AU - Kim, G. H.

AU - Kim, T. K.

PY - 2000/11

Y1 - 2000/11

N2 - E-beam evaporation was used to deposit the titanium oxide films with a thickness of 400 nm on silicon (Si) (100) at room temperature. The effect of oxygen on the surface roughness, composition and chemical states was studied by evaporating the titanium dioxide in the oxygen environment. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and X-ray absorption near-edge spectroscopy (XANES) were used for the analysis.

AB - E-beam evaporation was used to deposit the titanium oxide films with a thickness of 400 nm on silicon (Si) (100) at room temperature. The effect of oxygen on the surface roughness, composition and chemical states was studied by evaporating the titanium dioxide in the oxygen environment. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and X-ray absorption near-edge spectroscopy (XANES) were used for the analysis.

UR - http://www.scopus.com/inward/record.url?scp=0034317918&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034317918&partnerID=8YFLogxK

U2 - 10.1116/1.1312377

DO - 10.1116/1.1312377

M3 - Article

AN - SCOPUS:0034317918

SN - 0734-2101

VL - 18

SP - 2932

EP - 2936

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

IS - 6

ER -

Titanium oxide films on Si(100) deposited by e-beam evaporation

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this