E-beam evaporation was used to deposit the titanium oxide films with a thickness of 400 nm on silicon (Si) (100) at room temperature. The effect of oxygen on the surface roughness, composition and chemical states was studied by evaporating the titanium dioxide in the oxygen environment. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and X-ray absorption near-edge spectroscopy (XANES) were used for the analysis.
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Publication status||Published - 2000 Nov 1|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films