Tbis paper investigates the transmission characteristics of wafer scale interconnection Hues which are Modeled here by weakly coupled lossy transmission Unes. Laplace transform techniques and numerical methods are used to solve the coupled transmissionline equations in the weak coupling approximation. We obtain transient responses and crosstalk noise waveforms in the time domain. The modification of the coupling resulting from the losses is examined. Our analysis indicates that while there is some increase in coupling resulting from the losses, the rise-time dependent part of this coupling (which is a more severe component at high frequencies) is still suppressed for homogeneous dielectrics as is the case for lossless lines. However, other results seen in terminated lossless lines such as the absence of any coupling at the far end are degraded by the losses. A guide for determining the design parameters of the interconnections is presented along with some experimental results measured with actual fabricated wafer scale test structures.
Bibliographical noteFunding Information:
was supported by corporate sponsors of the Center for Integrated El=- tconics at the Renselaer Pol technic Institute under Grants from DEC, GE/CRD, Raytheorq and I&A TC. This paper was recanmended by M a t e Editor T. R. Viswanathan. J. Kim was with Rensselaer Polytechnic Institute, Troy, NY. He is now with AT&T Bell Laboratories, Murray Hill, NJ 07974. J. F. McDonald is with che Center for Integrated Elactronicr, Rensse-her Polytechnic Institute, Troy, NY 12181. IEFE Log Number 8823454.
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