Transition behavior of PS-b-PMMA films on the balanced interfacial interactions

Eunhye Kim, Seunghoon Choi, Rui Guo, Du Yeol Ryu, Craig J. Hawker, Thomas P. Russell

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

The thickness dependence of the order-to-disorder transition (ODT), measured by in situ grazing-incidence small-angle X-ray scattering (GISAXS), has been investigated in thin films of a symmetric polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) on a random copolymer (P(S-r-MMA)) grafted to the substrate where the interfacial interactions are balanced. With decreasing film thickness less than 25L0, the ODT significantly decreases to 193°C for film of 10L0 in thickness, because the interfacial interactions by a random copolymer grafted to the substrate provide a surface-induced compatibilization toward two block components. However, a plateau of the ODT at ∼213°C for films thicker than 25L0 was observed above the bulk value of 200°C. The elevation of this ODT indicates a suppression of compositional fluctuations normal to the film surface, more than likely because the dominant orientation of the lamellar microdomains was found to be parallel to the film surface.

Original languageEnglish
Pages (from-to)6313-6318
Number of pages6
Journalpolymer
Volume51
Issue number26
DOIs
Publication statusPublished - 2010 Dec 10

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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