Transition metal dichalcogenides (MoS2, MoSe2, WS2 and WSe2) exfoliation technique has strong influence upon their capacitance

Carmen C. Mayorga-Martinez, Adriano Ambrosi, Alex Yong Sheng Eng, Zdeněk Sofer, Martin Pumera

Research output: Contribution to journalArticlepeer-review

77 Citations (Scopus)

Abstract

Transition metal dichacogenides (TMD) represent an important class of layered compounds which are gaining lately an enormous interest in electrochemistry. Exfoliation of TMD materials to obtain single to few layer sheets is generally obtained through the intercalation of organolithium compounds. Here we investigated and compared the capacitive behavior of four representative TMD materials, i.e. MoS2, MoSe2, WS2 and WSe2 exfoliated with different organolithium intercalators, such as methyllithium (Me-Li), n-butyllithium (n-Bu-Li) and tert-butyllithium (t-Bu-Li). We found that both the metal/chalcogen composition and the type of intercalator strongly affect the capacitance of the exfoliated materials. These findings shall have profound implications on the construction of high-performance energy storage devices based on TMD.

Original languageEnglish
Pages (from-to)24-28
Number of pages5
JournalElectrochemistry Communications
Volume56
DOIs
Publication statusPublished - 2015 Jul 1

Bibliographical note

Funding Information:
M.P. acknowledges Tier 2 grant ( MOE2013-T2-1-056 ; ARC 35/13) from the Ministry of Education, Singapore . Z.S. was supported by the Czech Science Foundation (GACR No. 15-09001S ) and by Specific university research (MSMT No. 20/20151 ).

All Science Journal Classification (ASJC) codes

  • Electrochemistry

Fingerprint Dive into the research topics of 'Transition metal dichalcogenides (MoS<sub>2</sub>, MoSe<sub>2</sub>, WS<sub>2</sub> and WSe<sub>2</sub>) exfoliation technique has strong influence upon their capacitance'. Together they form a unique fingerprint.

Cite this