Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition

Gwihyun Kim, Seran Park, Hyunsu Shin, Seungho Song, Hoon Jung Oh, Dae Hong Ko, Jung Il Choi, Seung Jae Baik

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Atmospheric pressure (AP) operation of plasma-enhanced chemical vapor deposition (PECVD) is one of promising concepts for high quality and low cost processing. Atmospheric plasma discharge requires narrow gap configuration, which causes an inherent feature of AP PECVD. Two dimensional radial gas flows in AP PECVD induces radial variation of mass-transport and that of substrate temperature. The opposite trend of these variations would be the key consideration in the development of uniform deposition process. Another inherent feature of AP PECVD is confined plasma discharge, from which volume power density concept is derived as a key parameter for the control of deposition rate. We investigated deposition rate as a function of volume power density, gas flux, source gas partial pressure, hydrogen partial pressure, plasma source frequency, and substrate temperature; and derived a design guideline of deposition tool and process development in terms of deposition rate and uniformity.

Original languageEnglish
Article number125310
JournalAIP Advances
Volume7
Issue number12
DOIs
Publication statusPublished - 2017 Dec 1

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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