Uniform color coating of multilayered TiO2/Al2O3 films by atomic layer deposition

Woo Hee Kim, Hyungjun Kim, Han Bo Ram Lee

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Thin film optics, based on light interference characteristics, are attracting increasing interest because of their ability to enable a functional color coating for various applications in optical, electronic, and solar industries. Here, we report on the dependence of coloring characteristics on single-layer TiO2 thicknesses and alternating TiO2/Al2O3 multilayer structures prepared by atomic layer deposition (ALD) at a low growth temperature. The ALD TiO2 and Al2O3 thin films were studied at a low growth temperature of 80°C. Then, the coloring features in the single-layer TiO2 and alternating TiO2/Al2O3 multilayers using both the ALD processes were experimentally examined on a TiN/cut stainless steel sheet. The Essential Macleod software was used to estimate and compare the color coating results. The simulation results revealed that five different colors of the single TiO2 layers were shown experimentally, depending on the film thickness. For the purpose of highly uniform pink color coating, the film structures of TiO2/Al2O3 multilayers were designed in advance. It was experimentally demonstrated that the evaluated colors corresponded well with the simulated color spectrum results, exhibiting a uniform pink color with wide incident angles ranging from 0° to 75°. This article advances practical applications requiring highly uniform color coatings of surfaces in a variety of optical coating areas with complex topographical structures.

Original languageEnglish
Pages (from-to)177-183
Number of pages7
JournalJournal of Coatings Technology and Research
Volume14
Issue number1
DOIs
Publication statusPublished - 2017 Jan 1

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Colloid and Surface Chemistry

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