Unique photoluminescence of diacetylene containing dendrimer self-assemblies: Application in positive and negative luminescence patterning

Joo Ho Kim; Eunyoung Lee; Young Hwan Jeong; Woo Dong Jang

doi:10.1021/cm300762j

Unique photoluminescence of diacetylene containing dendrimer self-assemblies: Application in positive and negative luminescence patterning

Joo Ho Kim, Eunyoung Lee, Young Hwan Jeong, Woo Dong Jang

Department of Chemistry

Research output: Contribution to journal › Article

13 Citations (Scopus)

Abstract

A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH ₂Cl ₂ was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.

Original language	English
Pages (from-to)	2356-2363
Number of pages	8
Journal	Chemistry of Materials
Volume	24
Issue number	12
DOIs	https://doi.org/10.1021/cm300762j
Publication status	Published - 2012 Jun 26

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All Science Journal Classification (ASJC) codes

Chemistry(all)
Chemical Engineering(all)
Materials Chemistry

Cite this

Kim, J. H., Lee, E., Jeong, Y. H., & Jang, W. D. (2012). Unique photoluminescence of diacetylene containing dendrimer self-assemblies: Application in positive and negative luminescence patterning. Chemistry of Materials, 24(12), 2356-2363. https://doi.org/10.1021/cm300762j

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title = "Unique photoluminescence of diacetylene containing dendrimer self-assemblies: Application in positive and negative luminescence patterning",

abstract = "A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.",

author = "Kim, {Joo Ho} and Eunyoung Lee and Jeong, {Young Hwan} and Jang, {Woo Dong}",

year = "2012",

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AU - Kim, Joo Ho

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AU - Jang, Woo Dong

PY - 2012/6/26

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N2 - A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.

AB - A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.

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Access to Document

10.1021/cm300762j