Abstract
A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.
| Original language | English |
|---|---|
| Pages (from-to) | 2356-2363 |
| Number of pages | 8 |
| Journal | Chemistry of Materials |
| Volume | 24 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 2012 Jun 26 |
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All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Chemical Engineering(all)
- Materials Chemistry
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Unique photoluminescence of diacetylene containing dendrimer self-assemblies : Application in positive and negative luminescence patterning. / Kim, Joo Ho; Lee, Eunyoung; Jeong, Young Hwan; Jang, Woo Dong.
In: Chemistry of Materials, Vol. 24, No. 12, 26.06.2012, p. 2356-2363.Research output: Contribution to journal › Article
TY - JOUR
T1 - Unique photoluminescence of diacetylene containing dendrimer self-assemblies
T2 - Application in positive and negative luminescence patterning
AU - Kim, Joo Ho
AU - Lee, Eunyoung
AU - Jeong, Young Hwan
AU - Jang, Woo Dong
PY - 2012/6/26
Y1 - 2012/6/26
N2 - A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.
AB - A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.
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U2 - 10.1021/cm300762j
DO - 10.1021/cm300762j
M3 - Article
AN - SCOPUS:84862849242
VL - 24
SP - 2356
EP - 2363
JO - Chemistry of Materials
JF - Chemistry of Materials
SN - 0897-4756
IS - 12
ER -