Unique photoluminescence of diacetylene containing dendrimer self-assemblies

Application in positive and negative luminescence patterning

Joo Ho Kim, Eunyoung Lee, Young Hwan Jeong, Woo Dong Jang

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.

Original languageEnglish
Pages (from-to)2356-2363
Number of pages8
JournalChemistry of Materials
Volume24
Issue number12
DOIs
Publication statusPublished - 2012 Jun 26

Fingerprint

Dendrimers
Self assembly
Luminescence
Photoluminescence
Benzene
Irradiation
Membranes
Photomasks
Photopolymerization
Ultraviolet radiation
Ether
Ethers
Hydrogen bonds
Fluorescence

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

Cite this

@article{4322d00a938148dead958b290f226848,
title = "Unique photoluminescence of diacetylene containing dendrimer self-assemblies: Application in positive and negative luminescence patterning",
abstract = "A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.",
author = "Kim, {Joo Ho} and Eunyoung Lee and Jeong, {Young Hwan} and Jang, {Woo Dong}",
year = "2012",
month = "6",
day = "26",
doi = "10.1021/cm300762j",
language = "English",
volume = "24",
pages = "2356--2363",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society",
number = "12",

}

Unique photoluminescence of diacetylene containing dendrimer self-assemblies : Application in positive and negative luminescence patterning. / Kim, Joo Ho; Lee, Eunyoung; Jeong, Young Hwan; Jang, Woo Dong.

In: Chemistry of Materials, Vol. 24, No. 12, 26.06.2012, p. 2356-2363.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Unique photoluminescence of diacetylene containing dendrimer self-assemblies

T2 - Application in positive and negative luminescence patterning

AU - Kim, Joo Ho

AU - Lee, Eunyoung

AU - Jeong, Young Hwan

AU - Jang, Woo Dong

PY - 2012/6/26

Y1 - 2012/6/26

N2 - A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.

AB - A series of poly(benzyl ether) dendrimers with two benzene-1,3,5- tricarboxamide (BTA) units bridged by diacetylene were synthesized. The formation of hydrogen bonds between BTA units to form the supramolecular self-assembly was confirmed by FT-IR and AFM measurements. When the dendrimers in CH 2Cl 2 was excited with 280 nm irradiation, the dendrimers exhibited an unexpected strong photoluminescence (PL) around 450 nm in addition to 310 nm fluorescence upon excitation at 280 nm. The PL intensity of each dendrimers has shown generation dependency. With the continuous irradiation of 280 nm UV light, dendrimers exhibited decreased PL emission at both 310 and 450 nm by photopolymerization of diaceytlene units. A poly(vinylidene fluoride) (PVDF) membrane saturated with dendrimer solution were prepared to obtain a patterned PL image. Utilizing a photomask, a negative PL pattern was successfully obtained. When the membrane was annealed to 100 °C, new anomalous PL was generated and opposite type PL-patterned image could be obtained.

UR - http://www.scopus.com/inward/record.url?scp=84862849242&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84862849242&partnerID=8YFLogxK

U2 - 10.1021/cm300762j

DO - 10.1021/cm300762j

M3 - Article

VL - 24

SP - 2356

EP - 2363

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 12

ER -