Unraveling the selective etching mechanism of silicon nitride over silicon dioxide by phosphoric acid: First-principles study

Engineering & Materials Science

• Phosphoric acid 100%
• Silicon nitride 86%
• Etching 76%
• Silica 73%
• Orthophosphoric acid 26%
• Proton transfer 25%
• Silicon compounds 25%
• Thermodynamics 24%
• Density functional theory 21%
• Fabrication 21%
• Catalysis 18%
• Hydrolysis 17%
• Semiconductor devices 16%
• Chemical reactions 14%
• Molecules 13%
• Machinery 13%
• Screening 13%
• Acids 12%
• Semiconductor materials 12%
• Water 7%
• Temperature 5%

Physics & Astronomy

• phosphoric acid 98%
• silicon nitrides 69%
• silicon dioxide 54%
• etching 53%
• etchants 35%
• selectivity 26%
• acids 25%
• diphosphates 23%
• silicon compounds 22%
• thermodynamics 19%
• fabrication 17%
• machinery 16%
• catalysis 16%
• hydrolysis 16%
• semiconductor devices 14%
• chemical reactions 12%
• density functional theory 10%
• formalism 10%
• kinetics 8%
• water 8%
• molecules 7%

Chemistry

• Silicon Dioxide 86%
• Nitride 68%
• Phosphoric Acid 66%
• Etching 64%
• Diphosphate Group 23%
• Semiconductor 21%
• Silicon Molecular Entity 19%
• Thermodynamics 17%
• Hazardous Substance 16%
• Acid 9%
• Catalysis 9%
• Surface 9%
• Density Functional Theory 8%
• Hydrolysis 8%