Use of ordered mesoporous SiO2 as protection against thermal disturbance in phase-change memory

Tae Jung Ha, Sangwoo Shin, Hyung Keun Kim, Min Hee Hong, Chang Sun Park, Hyung Hee Cho, Doo Jin Choi, Hyung Ho Park

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

To commercialize phase change memory (PCM), a drastic change of resistivity at specific temperatures and a low power consumption to minimize heat transfer to neighboring cells are needed. Therefore, in this work, an ordered mesoporous SiO2 thin film of 45% porosity was introduced as an intercell dielectric in Ge1Sb4Te7 PCM because it has a low thermal conductivity (0.177 W/m K). By using a hybrid layer structure of mesoporous and dense SiO2 films, the temperature of neighboring cells could be decreased from 393.3 K to 353.2 K, corresponding to a 100-fold change in resistivity.

Original languageEnglish
Article number144102
JournalApplied Physics Letters
Volume102
Issue number14
DOIs
Publication statusPublished - 2013 Apr 8

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thermal protection
disturbances
electrical resistivity
cells
thermal conductivity
heat transfer
porosity
temperature
thin films

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Ha, Tae Jung ; Shin, Sangwoo ; Keun Kim, Hyung ; Hong, Min Hee ; Park, Chang Sun ; Hee Cho, Hyung ; Jin Choi, Doo ; Park, Hyung Ho. / Use of ordered mesoporous SiO2 as protection against thermal disturbance in phase-change memory. In: Applied Physics Letters. 2013 ; Vol. 102, No. 14.
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Use of ordered mesoporous SiO2 as protection against thermal disturbance in phase-change memory. / Ha, Tae Jung; Shin, Sangwoo; Keun Kim, Hyung; Hong, Min Hee; Park, Chang Sun; Hee Cho, Hyung; Jin Choi, Doo; Park, Hyung Ho.

In: Applied Physics Letters, Vol. 102, No. 14, 144102, 08.04.2013.

Research output: Contribution to journalArticle

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