Vaporization process of SiO2 particles for slurry injection in inductively coupled plasma atomic emission spectrometry

H. B. Lim, T. H. Kim, S. H. Eom, Yong Ik Sung, M. H. Moonb, D. W. Leec

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

In this work, the vaporization process of SiO2 particles in an ICP was theoretically and experimentally investigated. The emission intensity of Si I for the three different sizes of SiO2 particles, 0.35, 1.4 and 2.5 μm, was measured as the observation height varied. Based on these experimental heights, the heat-transfer and mass-transfer models were applied in order to understand the vaporization process of SiO2 particles in an ICP. When a heat-transfer-controlled model is considered for the process, the rate for a SiO2 particle in the tested size became comparable to that obtained by experiment. SiO2 particles in the range of 0.3-2.6 μm seemed to be vaporized by a heat-transfer-controlled mechanism, rather than by a Knudsen-effect-corrected heat-transfer-controlled or mass-transfer-controlled mechanism in an atmospheric pressure ICP.

Original languageEnglish
Pages (from-to)109-114
Number of pages6
JournalJournal of Analytical Atomic Spectrometry
Volume17
Issue number2
DOIs
Publication statusPublished - 2002

All Science Journal Classification (ASJC) codes

  • Analytical Chemistry
  • Spectroscopy

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