Various approaches for high performance and stable oxide thin-film transistors

Yeong Gyu Kim, Jae Won Na, Won Gi Kim, Hyun Jae Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We investigated various approaches to enhance the electrical performance and stability of oxide thin-film transistors (TFTs) fabricated with vacuum- and solution-process: vertically graded oxygen vacancy active layer (VGA) by control of oxygen partial pressure, sequential pressure annealing (SPA), and hydrogen peroxide activation (HPA) using ultraviolet irradiation. By adopting these techniques, we could effectively control the defect densities in active layer which resulted in high performance and stable oxide TFTs.

Original languageEnglish
Title of host publicationProceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices
Subtitle of host publicationTFT Technologies and FPD Materials
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages25-28
Number of pages4
ISBN (Electronic)9784863484771
DOIs
Publication statusPublished - 2015 Jul 30
Event22nd International Workshop on Active-Matrix Flatpanel Displays and Devices, AM-FPD 2015 - Kyoto, Japan
Duration: 2015 Jul 12015 Jul 4

Publication series

NameProceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials

Other

Other22nd International Workshop on Active-Matrix Flatpanel Displays and Devices, AM-FPD 2015
CountryJapan
CityKyoto
Period15/7/115/7/4

Fingerprint

Thin film transistors
Oxide films
Defect density
Oxygen vacancies
Hydrogen peroxide
Partial pressure
Hydrogen Peroxide
Reactive Oxygen Species
Chemical activation
Irradiation
Vacuum
Annealing
Oxygen

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Kim, Y. G., Na, J. W., Kim, W. G., & Kim, H. J. (2015). Various approaches for high performance and stable oxide thin-film transistors. In Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials (pp. 25-28). [7173187] (Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/AM-FPD.2015.7173187
Kim, Yeong Gyu ; Na, Jae Won ; Kim, Won Gi ; Kim, Hyun Jae. / Various approaches for high performance and stable oxide thin-film transistors. Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials. Institute of Electrical and Electronics Engineers Inc., 2015. pp. 25-28 (Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials).
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abstract = "We investigated various approaches to enhance the electrical performance and stability of oxide thin-film transistors (TFTs) fabricated with vacuum- and solution-process: vertically graded oxygen vacancy active layer (VGA) by control of oxygen partial pressure, sequential pressure annealing (SPA), and hydrogen peroxide activation (HPA) using ultraviolet irradiation. By adopting these techniques, we could effectively control the defect densities in active layer which resulted in high performance and stable oxide TFTs.",
author = "Kim, {Yeong Gyu} and Na, {Jae Won} and Kim, {Won Gi} and Kim, {Hyun Jae}",
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Kim, YG, Na, JW, Kim, WG & Kim, HJ 2015, Various approaches for high performance and stable oxide thin-film transistors. in Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials., 7173187, Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, Institute of Electrical and Electronics Engineers Inc., pp. 25-28, 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices, AM-FPD 2015, Kyoto, Japan, 15/7/1. https://doi.org/10.1109/AM-FPD.2015.7173187

Various approaches for high performance and stable oxide thin-film transistors. / Kim, Yeong Gyu; Na, Jae Won; Kim, Won Gi; Kim, Hyun Jae.

Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials. Institute of Electrical and Electronics Engineers Inc., 2015. p. 25-28 7173187 (Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Kim YG, Na JW, Kim WG, Kim HJ. Various approaches for high performance and stable oxide thin-film transistors. In Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials. Institute of Electrical and Electronics Engineers Inc. 2015. p. 25-28. 7173187. (Proceedings of AM-FPD 2015 - 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials). https://doi.org/10.1109/AM-FPD.2015.7173187