Wafer-level detection of organic contamination by ZnO-rGO hybrid-assisted laser desorption/ionization time-of-flight mass spectrometry

Chemistry

• Amount 50%
• Atom 25%
• Benzo[a]pyrene 50%
• Concentration 75%
• Hydrothermal Method 25%
• Industry 25%
• Ionization 50%
• Laser Desorption 50%
• Matrix Assisted Laser Desorption Ionization - Time of Flight (MALDI-TOF) 25%
• Procedure 100%
• Semiconductor 75%
• Surface 25%
• Time of Flight Mass Spectroscopy 50%
• Zinc Oxide 50%

Material Science

• Reduced Graphene Oxide 50%
• Semiconductor Material 75%
• Surface 25%