Wafer-scale sub-micron lithography

Dahl-Young Khang, Hong H. Lee

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Wafer scale imprint lithography is introduced and demonstrated. Pattern features down to 100 nm in size are shown to be lithographed over the entire area of a silicon wafer 4 in. in diameter. An asymmetric heating and quenching cycle is used for the pattern fidelity. Simple mechanical arrangements make the wafer-scale lithography possible.

Original languageEnglish
Pages (from-to)2599-2601
Number of pages3
JournalApplied Physics Letters
Volume75
Issue number17
DOIs
Publication statusPublished - 1999 Oct 25

Fingerprint

lithography
wafers
quenching
cycles
heating
silicon

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Khang, Dahl-Young ; Lee, Hong H. / Wafer-scale sub-micron lithography. In: Applied Physics Letters. 1999 ; Vol. 75, No. 17. pp. 2599-2601.
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Wafer-scale sub-micron lithography. / Khang, Dahl-Young; Lee, Hong H.

In: Applied Physics Letters, Vol. 75, No. 17, 25.10.1999, p. 2599-2601.

Research output: Contribution to journalArticle

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