Wafer-scale sub-micron lithography

Dahl Young Khang, Hong H. Lee

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24 Citations (Scopus)

Abstract

Wafer scale imprint lithography is introduced and demonstrated. Pattern features down to 100 nm in size are shown to be lithographed over the entire area of a silicon wafer 4 in. in diameter. An asymmetric heating and quenching cycle is used for the pattern fidelity. Simple mechanical arrangements make the wafer-scale lithography possible.

Original languageEnglish
Pages (from-to)2599-2601
Number of pages3
JournalApplied Physics Letters
Volume75
Issue number17
DOIs
Publication statusPublished - 1999 Oct 25

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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