Wafer-scale sub-micron lithography

Dahl Young Khang; Hong H. Lee

doi:10.1063/1.125090

Wafer-scale sub-micron lithography

Dahl Young Khang, Hong H. Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

Wafer scale imprint lithography is introduced and demonstrated. Pattern features down to 100 nm in size are shown to be lithographed over the entire area of a silicon wafer 4 in. in diameter. An asymmetric heating and quenching cycle is used for the pattern fidelity. Simple mechanical arrangements make the wafer-scale lithography possible.

Original language	English
Pages (from-to)	2599-2601
Number of pages	3
Journal	Applied Physics Letters
Volume	75
Issue number	17
DOIs	https://doi.org/10.1063/1.125090
Publication status	Published - 1999 Oct 25

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.125090

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title = "Wafer-scale sub-micron lithography",

abstract = "Wafer scale imprint lithography is introduced and demonstrated. Pattern features down to 100 nm in size are shown to be lithographed over the entire area of a silicon wafer 4 in. in diameter. An asymmetric heating and quenching cycle is used for the pattern fidelity. Simple mechanical arrangements make the wafer-scale lithography possible.",

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AB - Wafer scale imprint lithography is introduced and demonstrated. Pattern features down to 100 nm in size are shown to be lithographed over the entire area of a silicon wafer 4 in. in diameter. An asymmetric heating and quenching cycle is used for the pattern fidelity. Simple mechanical arrangements make the wafer-scale lithography possible.

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Wafer-scale sub-micron lithography

Abstract

All Science Journal Classification (ASJC) codes

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