Wear minimization through utilization of atomic-scale functional surface structure

Hyun Joon Kim, Dae Eun Kim

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A method for wear minimization through utilization of an atomic-scale functional surface structure is proposed. The basic idea is to effectively dissipate the frictional energy generated during contact sliding so that its contribution to permanent displacement of atoms is minimized. This may be achieved by using a surface structure with optimum compliance that can accommodate the contact stresses through elastic, rather than permanent, deformation of the structure. This method was verified through molecular dynamics simulation of atomic-scale wear of a tip sliding against a hard coating layer that is supported by an atomic-scale functional surface structure.

Original languageEnglish
Article number151904
JournalApplied Physics Letters
Volume103
Issue number15
DOIs
Publication statusPublished - 2013 Oct 7

Fingerprint

optimization
sliding contact
sliding
molecular dynamics
coatings
atoms
simulation
energy

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

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Wear minimization through utilization of atomic-scale functional surface structure. / Kim, Hyun Joon; Kim, Dae Eun.

In: Applied Physics Letters, Vol. 103, No. 15, 151904, 07.10.2013.

Research output: Contribution to journalArticle

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AB - A method for wear minimization through utilization of an atomic-scale functional surface structure is proposed. The basic idea is to effectively dissipate the frictional energy generated during contact sliding so that its contribution to permanent displacement of atoms is minimized. This may be achieved by using a surface structure with optimum compliance that can accommodate the contact stresses through elastic, rather than permanent, deformation of the structure. This method was verified through molecular dynamics simulation of atomic-scale wear of a tip sliding against a hard coating layer that is supported by an atomic-scale functional surface structure.

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