X-ray absorption spectroscopy studies of nickel oxide thin film electrodes for supercapacitors

Kyung Wan Nam; Won Sub Yoon; Kwang Bum Kim

doi:10.1016/S0013-4686(02)00240-2

X-ray absorption spectroscopy studies of nickel oxide thin film electrodes for supercapacitors

Kyung Wan Nam, Won Sub Yoon, Kwang Bum Kim

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

182 Citations (Scopus)

Abstract

Nickel oxide films were synthesized by electrochemical precipitation of Ni(OH)₂ followed by heat-treatment in air at various temperatures (200-600 °C). Their structure and electrochemical properties were studied by cyclic voltammetry, X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS). XRD results showed that the nickel oxide obtained at 250 °C or above has a crystalline NiO structure. The specific capacitance of the oxide depends on the heat-treatment temperature, showing a maximum value at 300 °C. XAS results revealed that the non-stoichiometric nickel oxide (Ni_1-xO) approached the stoichiometric NiO structure with increasing heat-treatment temperature due to the defect healing effect. The defective nature of the nickel oxide could be utilized to improve its specific capacitance for supercapacitor application.

Original language	English
Pages (from-to)	3201-3209
Number of pages	9
Journal	Electrochimica Acta
Volume	47
Issue number	19
DOIs	https://doi.org/10.1016/S0013-4686(02)00240-2
Publication status	Published - 2002 Jul 27

Bibliographical note

Funding Information:
This study was supported by Korea Science and Engineering Foundation (KOSEF) Research Project (no. 2001-6-301-07-2) and the Brain Korea 21 Project. The authors are grateful to authorities at the Pohang Light Sources for X-ray absorption spectroscopic measurements.

All Science Journal Classification (ASJC) codes

Chemical Engineering(all)
Electrochemistry

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title = "X-ray absorption spectroscopy studies of nickel oxide thin film electrodes for supercapacitors",

abstract = "Nickel oxide films were synthesized by electrochemical precipitation of Ni(OH)2 followed by heat-treatment in air at various temperatures (200-600 °C). Their structure and electrochemical properties were studied by cyclic voltammetry, X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS). XRD results showed that the nickel oxide obtained at 250 °C or above has a crystalline NiO structure. The specific capacitance of the oxide depends on the heat-treatment temperature, showing a maximum value at 300 °C. XAS results revealed that the non-stoichiometric nickel oxide (Ni1-xO) approached the stoichiometric NiO structure with increasing heat-treatment temperature due to the defect healing effect. The defective nature of the nickel oxide could be utilized to improve its specific capacitance for supercapacitor application.",

author = "Nam, {Kyung Wan} and Yoon, {Won Sub} and Kim, {Kwang Bum}",

note = "Funding Information: This study was supported by Korea Science and Engineering Foundation (KOSEF) Research Project (no. 2001-6-301-07-2) and the Brain Korea 21 Project. The authors are grateful to authorities at the Pohang Light Sources for X-ray absorption spectroscopic measurements. ",

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doi = "10.1016/S0013-4686(02)00240-2",

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T1 - X-ray absorption spectroscopy studies of nickel oxide thin film electrodes for supercapacitors

AU - Nam, Kyung Wan

AU - Yoon, Won Sub

AU - Kim, Kwang Bum

N1 - Funding Information: This study was supported by Korea Science and Engineering Foundation (KOSEF) Research Project (no. 2001-6-301-07-2) and the Brain Korea 21 Project. The authors are grateful to authorities at the Pohang Light Sources for X-ray absorption spectroscopic measurements.

PY - 2002/7/27

Y1 - 2002/7/27

N2 - Nickel oxide films were synthesized by electrochemical precipitation of Ni(OH)2 followed by heat-treatment in air at various temperatures (200-600 °C). Their structure and electrochemical properties were studied by cyclic voltammetry, X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS). XRD results showed that the nickel oxide obtained at 250 °C or above has a crystalline NiO structure. The specific capacitance of the oxide depends on the heat-treatment temperature, showing a maximum value at 300 °C. XAS results revealed that the non-stoichiometric nickel oxide (Ni1-xO) approached the stoichiometric NiO structure with increasing heat-treatment temperature due to the defect healing effect. The defective nature of the nickel oxide could be utilized to improve its specific capacitance for supercapacitor application.

AB - Nickel oxide films were synthesized by electrochemical precipitation of Ni(OH)2 followed by heat-treatment in air at various temperatures (200-600 °C). Their structure and electrochemical properties were studied by cyclic voltammetry, X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS). XRD results showed that the nickel oxide obtained at 250 °C or above has a crystalline NiO structure. The specific capacitance of the oxide depends on the heat-treatment temperature, showing a maximum value at 300 °C. XAS results revealed that the non-stoichiometric nickel oxide (Ni1-xO) approached the stoichiometric NiO structure with increasing heat-treatment temperature due to the defect healing effect. The defective nature of the nickel oxide could be utilized to improve its specific capacitance for supercapacitor application.

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X-ray absorption spectroscopy studies of nickel oxide thin film electrodes for supercapacitors

Abstract

Bibliographical note

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